07:01 Mar 10, 2011 |
English to Serbian translations [PRO] Law/Patents - Patents / maskwork | |||||||
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4 | topografija integrisanih kola |
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topografija integrisanih kola Explanation: http://www.proz.com/kudoz/english_to_serbian/law:_patents_tr... Topografija, jeste na bilo koji način prikazan trodimenzionalni raspored elemenata, od kojih je najmanje jedan aktivan, i međuveza u integrisanom kolu, ili takav trodimenzionalni raspored pripremljen za proizvodnju određenog integrisanog kola. Integrisano kolo, jeste gotov proizvod ili međuproizvod u kome se ostvaruje određena elektronska funkcija i u kome su elementi, od kojih je najmanje jedan aktivan, i međuveze integralno formirani u komadu materijala ili na komadu materijala, odnosno i u komadu i na komadu materijala. http://en.wikipedia.org/wiki/Integrated_circuit_layout_desig... In United States intellectual property law, a mask work is a two or three-dimensional layout or topography of an integrated circuit (IC or "chip"), i.e. the arrangement on a chip of semiconductor devices such as transistors and passive electronic components such as resistorsand interconnections. By extension, it also refers to the copyright-like intellectual property right conferring time-limited exclusivity to reproduction of a particular layout. The layout is called a mask work because, in photolithographic processes, the multiple etched layers within actual ICs are each created using a mask, called the photomask, to permit or block the light at specific locations, sometimes for hundreds of chips on a wafer simultaneously. Reference: http://www.proz.com/kudoz/english_to_serbian/law:_patents_tr... Reference: http://en.wikipedia.org/wiki/Integrated_circuit_layout_desig... |
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Reference Reference information: http://www.proz.com/kudoz/english_to_serbo_croat/law:_contra... |
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